Poly(dimethylsiloxane) (PDMS) surface patterning by biocompatible photo-crosslinking block copolymers?
RSC Advances Pub Date: 2015-05-20 DOI: 10.1039/C5RA08843G
Abstract
Poly(2-methacryloyloxyethyl phosphorylcholine) (PMPC) possesses protein antifouling properties. Diblock copolymers (PMPC120-b-P(TSM/CEAx)y) composed of a PMPC block and random copolymer block with 3-(tris(trimethylsiloxy)silyl)propyl methacrylate (TSM) and 2-cinnamoylethyl acrylate (CEA) were prepared via reversible addition–fragmentation chain transfer (RAFT) radical polymerization. A thin film of PMPC120-P(TSM/CEAx)y formed on the surface of the poly(dimethylsiloxane) (PDMS) substrate due to physical adsorption of the TSM units to poly(dimethylsiloxane) (PDMS) and photo-crosslinking of the CEA units. A lattice pattern of PMPC120-P(TSM/CEAx)y on the PDMS surface was prepared using UV irradiation through a photomask. PMPC120-P(TSM/CEAx)y-coated PDMS demonstrated protein antifouling activity. Cell patterning could be achieved by culturing on the PMPC-patterned PDMS substrate.
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Journal Name：RSC Advances
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