Photolithographic properties of ultrathin polymer Langmuir–Blodgett films containing anthracene moieties
Journal of Materials Chemistry Pub Date: 2003-05-27 DOI: 10.1039/B300686G
Abstract
This study investigated the unique photolithographic properties of poly(N-neopentyl methacrylamide-co-9-anthrylmethyl methacrylate)
(p(nPMA-AMMA)) ultrathin films prepared by the Langmuir–Blodgett (LB) technique. The
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Journal Name：Journal of Materials Chemistry
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CAS no.: 89640-58-4
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