Mononuclear precursor for MOCVD of HfO2 thin films?
Chemical Communications Pub Date: 2004-06-17 DOI: 10.1039/B405015K
Abstract
We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(OiPr)2(tbaoac)2] and its application towards
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Journal Name：Chemical Communications
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CAS no.: 89640-58-4
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