Cas no 352535-01-4 (Tetrakis(ethylmethylamino)hafnium(IV))
Tetrakis(ethylmethylamino)hafnium(IV) is a metalorganic precursor used in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for hafnium-based thin films. Its key advantages include high volatility and thermal stability, enabling precise control over film composition and uniformity. The compound’s reactive ethylmethylamino ligands facilitate low-temperature deposition, making it suitable for temperature-sensitive substrates. It is particularly valued in semiconductor manufacturing for producing high-κ dielectric layers, such as hafnium oxide (HfO?), which are critical for advanced logic and memory devices. The precursor’s consistent purity and reliable performance contribute to reproducible film properties, meeting stringent industry requirements.
352535-01-4 structure
Product Name:Tetrakis(ethylmethylamino)hafnium(IV)
CAS No:352535-01-4
MF:C12H32HfN4
MW:410.89928817749
MDL:MFCD03427130
CID:92798
PubChem ID:24879306
Update Time:2025-06-06
Tetrakis(ethylmethylamino)hafnium(IV) Chemical and Physical Properties
Names and Identifiers
-
- Tetrakis(ethylmethylamino)hafnium(IV)
- ethyl(methyl)azanide,hafnium(4+)
- HAFNIUM TETRAKIS(ETHYLMETHYLAMIDE)
- TEMAH
- TEMAH (Tetrakis(ethylmethylamino)hafnium(IV)
- MFCD03427130
- SCHEMBL237323
- Tetrakis(ethylmethylamido)hafnium(IV)
- 352535-01-4
- Tetrakis(ethylmethylamido)hafnium(IV), packaged for use in deposition systems
- ethyl(methyl)azanide;hafnium(4+)
- Tetrakis(ethylmethylamido)hafnium(IV), >=99.99% trace metals basis
- Tetrakis(ethylmethylamino)hafnium
- Tetrakis(ethylmethylamino)hafnium 99.999%
- Ethanamine, N-methyl-, hafnium(4+) salt (4:1)
- DTXSID70108284
- DB-009835
-
- MDL： MFCD03427130
- Inchi： 1S/4C3H8N.Hf/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4
- InChI Key： NPEOKFBCHNGLJD-UHFFFAOYSA-N
- SMILES： [Hf+4].[N-](C)CC.[N-](C)CC.[N-](C)CC.[N-](C)CC
Computed Properties
- Exact Mass: 412.20900
- Monoisotopic Mass: 412.209
- Isotope Atom Count: 0
- Hydrogen Bond Donor Count: 0
- Hydrogen Bond Acceptor Count: 4
- Heavy Atom Count: 17
- Rotatable Bond Count: 4
- Complexity: 50.5
- Covalently-Bonded Unit Count: 5
- Defined Atom Stereocenter Count: 0
- Undefined Atom Stereocenter Count : 0
- Defined Bond Stereocenter Count: 0
- Undefined Bond Stereocenter Count: 0
- Surface Charge: 0
- Tautomer Count: nothing
- XLogP3: nothing
- Topological Polar Surface Area: 4A^2
Experimental Properties
- Color/Form: Yellow liquid
- Density: 1.324?g/mL?at 25?°C(lit.)
- Melting Point: <-50?°C
- Boiling Point: 78?°C/0.01?mmHg(lit.)
- Flash Point: Fahrenheit: 51.8 ° f < br / > Celsius: 11 ° C < br / >
- PSA: 12.96000
- LogP: 1.60960
- Solubility: Strong reaction with water
- Sensitiveness: Air & Moisture Sensitive
Tetrakis(ethylmethylamino)hafnium(IV) Security Information
-
Symbol:
- Signal Word：Danger
- Hazard Statement： H225-H261-H315-H319-H335
- Warning Statement： P210-P231+232-P233-P261-P302+P335+P334-P370+P378
- Hazardous Material transportation number：UN 3398 4.3/PG 2
- WGK Germany：3
- Hazard Category Code： 11-14-36/37/38
- Safety Instruction： S16; S26; S36
-
Hazardous Material Identification：
- Packing Group：II
- Hazard Level：4.3
- HazardClass：4.3
- PackingGroup：II
- TSCA：No
- Storage Condition：2-8°C
- Safety Term：4.3
- Packing Group：II
- Risk Phrases：R11
Tetrakis(ethylmethylamino)hafnium(IV) Customs Data
- HS CODE：2921199090
- Customs Data：
China Customs Code:
2921199090Overview:
2921199090 Other acyclic monoamines and their derivatives and salts.Regulatory conditions:nothing.VAT:17.0%.Tax refund rate:9.0%.MFN tariff:6.5%.general tariff:30.0%
Declaration elements:
Product Name, component content, use to
Summary:
2921199090 other acyclic monoamines and their derivatives; salts thereof VAT:17.0% Tax rebate rate:9.0% Supervision conditions:none MFN tariff:6.5% General tariff:30.0%
Tetrakis(ethylmethylamino)hafnium(IV) Pricemore >>
| Related Categories | No. | Product Name | Cas No. | Purity | Specification | Price | update time | Inquiry |
|---|---|---|---|---|---|---|---|---|
| SHANG HAI XIAN DING Biotechnology Co., Ltd. | 72-7720-10g |
Tetrakis(ethylmethylamino)hafnium(IV),99% |
352535-01-4 | 99%(99.99+%-Hf,＜0.15%Zr)TEMAHPURATREM | 10g |
3762CNY | 2021-05-08 | |
| SHANG HAI XIAN DING Biotechnology Co., Ltd. | 72-7720-2g |
Tetrakis(ethylmethylamino)hafnium(IV),99% |
352535-01-4 | 99%(99.99+%-Hf,＜0.15%Zr)TEMAHPURATREM | 2g |
940CNY | 2021-05-08 | |
| SHANG HAI XIAN DING Biotechnology Co., Ltd. | 98-4048-10g |
Tetrakis(ethylmethylamino)hafnium(IV),99% |
352535-01-4 | 99%(99.99+%-Hf,＜0.15%Zr)TEMAH,PURATREM,72-7720,containedin50mlSwagelokcylinder(96-1070)forCVD/ALD | 10g |
11970CNY | 2021-05-08 | |
| XI GE MA AO DE LI QI （ SHANG HAI ） MAO YI Co., Ltd. | 725544-10G |
Tetrakis(ethylmethylamino)hafnium(IV) |
352535-01-4 | 10g |
￥9252.75 | 2023-11-26 | ||
| SU ZHOU XIN JIA YUAN HUA XUE Technology Co., Ltd. | x2-007-5g |
Tetrakis(ethylmethylamino)hafnium(IV) |
352535-01-4 | 99% | 5g |
￥1650.0 | 2023-09-15 | |
| XI GE MA AO DE LI QI （ SHANG HAI ） MAO YI Co., Ltd. | 553123-5ML |
Tetrakis(ethylmethylamino)hafnium(IV) |
352535-01-4 | 5ml |
￥2801.39 | 2023-12-04 | ||
| XI GE MA AO DE LI QI （ SHANG HAI ） MAO YI Co., Ltd. | 553123-25ML |
Tetrakis(ethylmethylamino)hafnium(IV) |
352535-01-4 | 25ml |
￥8360.73 | 2023-12-04 | ||
| SU ZHOU XIN JIA YUAN HUA XUE Technology Co., Ltd. | FN0008-1g |
Tetrakis(ethylmethylamino)hafnium(IV) |
352535-01-4 | 4N | 1g |
￥290.0 | 2023-09-15 | |
| abcr | AB304151-10 g |
Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr), in 50 ml Swagelok cylinder for CVD/ALD; . |
352535-01-4 | 99% | 10 g |
€1,264.00 | 2023-07-19 | |
| abcr | AB304149-2 g |
Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr) PURATREM; . |
352535-01-4 | 99% | 2g |
€92.40 | 2023-04-26 |
Tetrakis(ethylmethylamino)hafnium(IV) Suppliers
Amadis Chemical Company Limited
Gold Member
Audited Supplier
(CAS:352535-01-4)Tetrakis(ethylmethylamino)hafnium(IV)
Order Number:A1211437
Stock Status:in Stock
Quantity:5g/2g/10g
Purity:99%
Pricing Information Last Updated:Monday, 2 September 2024 15:59
Price ($):309.0/185.0/2732.0
Email:[email protected]
Tetrakis(ethylmethylamino)hafnium(IV) Related Literature
-
Shu-Hong Shen,Xue-Feng Wang,Ye Tian,Ming-Rui Li,Yi Yang,Tian-Ling Ren Nanoscale 2019 11 11114
-
Alireza Kashir,Mehrdad Ghiasabadi Farahani,Hyunsang Hwang Nanoscale 2021 13 13631
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3. Fabrication of carbon/refractory metal nanocomposites as thermally stable metallic photonic crystalsPrashant Nagpal,David P. Josephson,Nicholas R. Denny,Joseph DeWilde,David J. Norris,Andreas Stein J. Mater. Chem. 2011 21 10836
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4. Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer depositionLi Zheng,Xinhong Cheng,Yuehui Yu,Yahong Xie,Xiaolong Li,Zhongjian Wang Phys. Chem. Chem. Phys. 2015 17 3179
-
Kathryn A. Perrine,Andrew V. Teplyakov Chem. Soc. Rev. 2010 39 3256
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Recommended suppliers
Amadis Chemical Company Limited
(CAS:352535-01-4)Tetrakis(ethylmethylamino)hafnium(IV)
Purity:99%/99%/99%
Quantity:5g/2g/10g
Price ($):309.0/185.0/2732.0