Cas no 31499-71-5 (Trisulfide, ethylmethyl (8CI,9CI))
31499-71-5 structure
Product Name:Trisulfide, ethylmethyl (8CI,9CI)
CAS No:31499-71-5
MF:C3H8S3
MW:140.290616989136
CID:308666
Update Time:2025-04-19
Trisulfide, ethylmethyl (8CI,9CI) Chemical and Physical Properties
Names and Identifiers
-
- Trisulfide, ethylmethyl (8CI,9CI)
- (methyltrisulfanyl)ethane
- 2,3,4-trithiahexane
- Aethyl-methyl-trisulfid
- ethyl methyl trisulfide
- methyl ethyl trisulfide
- Methyl ethyl trisulphide
- Trisulfide,ethyl methyl
-
- Inchi： 1S/C3H8S3/c1-3-5-6-4-2/h3H2,1-2H3
- InChI Key： XEKUTWIJPKGAQT-UHFFFAOYSA-N
- SMILES： CCSSSC
Computed Properties
- Exact Mass: 139.97900
- Monoisotopic Mass: 139.978812
- Isotope Atom Count: 0
- Hydrogen Bond Donor Count: 0
- Hydrogen Bond Acceptor Count: 3
- Heavy Atom Count: 6
- Rotatable Bond Count: 3
- Complexity: 22
- Covalently-Bonded Unit Count: 1
- Defined Atom Stereocenter Count: 0
- Undefined Atom Stereocenter Count : 0
- Defined Bond Stereocenter Count: 0
- Undefined Bond Stereocenter Count: 0
- Topological Polar Surface Area: 75.9
Experimental Properties
- Density: 1.169
- Boiling Point: 201.7°Cat760mmHg
- Flash Point: 78°C
- Refractive Index: 1.58
- PSA: 75.90000
- LogP: 2.66570
- FEMA: 3861 | METHYL ETHYL TRISULFIDE
Trisulfide, ethylmethyl (8CI,9CI) Customs Data
- HS CODE：2930909090
- Customs Data：
China Customs Code:
2930909090Overview:
2930909090. Other organic sulfur compounds. VAT:17.0%. Tax refund rate:13.0%. Regulatory conditions:nothing. MFN tariff:6.5%. general tariff:30.0%
Declaration elements:
Product Name, component content, use to
Summary:
2930909090. other organo-sulphur compounds. VAT:17.0%. Tax rebate rate:13.0%. . MFN tariff:6.5%. General tariff:30.0%
Trisulfide, ethylmethyl (8CI,9CI) Related Literature
-
A. B. F. da Silva,K. Capelle Phys. Chem. Chem. Phys., 2009,11, 4564-4569
-
Yukiya Kitayama Polym. Chem., 2014,5, 2784-2792
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Albertus D. Handoko,Khoong Hong Khoo,Teck Leong Tan,Hongmei Jin,Zhi Wei Seh J. Mater. Chem. A, 2018,6, 21885-21890
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Aloke Das,K. K. Mahato,Chayan K. Nandi,Tapas Chakraborty,Shridhar R. Gadre,Nikhil A. Gokhale Phys. Chem. Chem. Phys., 2002,4, 2162-2168
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