Cas no 23586-77-8 ((Chloromethoxy)trimethylsilane)
23586-77-8 structure
Product Name:(Chloromethoxy)trimethylsilane
CAS No:23586-77-8
MF:C4H11ClOSi
MW:138.668041467667
MDL:MFCD17013366
CID:2837089
PubChem ID:53436206
Update Time:2025-04-21
(Chloromethoxy)trimethylsilane Chemical and Physical Properties
Names and Identifiers
-
- AC9008
- SCHEMBL1394216
- 23586-77-8
- (Chloromethoxy)(trimethyl)silane
- MFCD17013366
- AKOS006384458
- DTXSID70700868
- SY253204
- chloromethoxytrimethylsilane
- Silane, (chloromethoxy)trimethyl-
- (CHLOROMETHOXY)TRIMETHYLSILANE
- (Chloromethoxy)trimethylsilane
-
- MDL： MFCD17013366
- Inchi： 1S/C4H11ClOSi/c1-7(2,3)6-4-5/h4H2,1-3H3
- InChI Key： AGQQMHKCHBWIAX-UHFFFAOYSA-N
- SMILES： ClCO[Si](C)(C)C
Computed Properties
- Exact Mass: 138.0267692Da
- Monoisotopic Mass: 138.0267692Da
- Isotope Atom Count: 0
- Hydrogen Bond Donor Count: 0
- Hydrogen Bond Acceptor Count: 1
- Heavy Atom Count: 7
- Rotatable Bond Count: 2
- Complexity: 50.1
- Covalently-Bonded Unit Count: 1
- Defined Atom Stereocenter Count: 0
- Undefined Atom Stereocenter Count : 0
- Defined Bond Stereocenter Count: 0
- Undefined Bond Stereocenter Count: 0
- Topological Polar Surface Area: 9.2?2
(Chloromethoxy)trimethylsilane Pricemore >>
| Related Categories | No. | Product Name | Cas No. | Purity | Specification | Price | update time | Inquiry |
|---|---|---|---|---|---|---|---|---|
| eNovation Chemicals LLC | D779627-1g |
(Chloromethoxy)trimethylsilane |
23586-77-8 | 95% | 1g |
$1450 | 2024-07-20 | |
| eNovation Chemicals LLC | D779627-1g |
(Chloromethoxy)trimethylsilane |
23586-77-8 | 95% | 1g |
$1450 | 2025-02-22 | |
| eNovation Chemicals LLC | D779627-1g |
(Chloromethoxy)trimethylsilane |
23586-77-8 | 95% | 1g |
$1450 | 2025-02-25 | |
| A2B Chem LLC | AB23906-1g |
Silane, (chloromethoxy)trimethyl- |
23586-77-8 | 1g |
$1215.00 | 2024-04-20 |
(Chloromethoxy)trimethylsilane Related Literature
-
Joseph H. Bisesi,Tara Sabo-Attwood Environ. Sci.: Nano, 2014,1, 574-583
-
Andreas Nenning,Manuel Holzmann,Jürgen Fleig,Alexander K. Opitz Mater. Adv., 2021,2, 5422-5431
-
Partha Laskar,Christine Dufès Nanoscale Adv., 2021,3, 6007-6026
-
Yong Ping Huang,Tao Tao,Zheng Chen,Wei Han,Ying Wu,Chunjiang Kuang,Shaoxiong Zhou,Ying Chen J. Mater. Chem. A, 2014,2, 18831-18837
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