Cas no 2172-02-3 (Hafnium t-butoxide)

Hafnium t-butoxide (Hf(OtBu)?) is a metal-organic compound widely used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for hafnium oxide thin films. Its high volatility and thermal stability make it suitable for precise thin-film growth in semiconductor and dielectric applications. The compound exhibits excellent reactivity with oxygen and water, facilitating controlled oxide formation at relatively low temperatures. Hafnium t-butoxide is valued for its purity and consistency, ensuring reproducible film quality with minimal impurities. Its compatibility with industrial deposition techniques makes it a preferred choice for advanced electronic and optoelectronic device fabrication.
Hafnium t-butoxide structure
Hafnium t-butoxide structure
Product Name:Hafnium t-butoxide
CAS No:2172-02-3
MF:C16H36HfO4
MW:470.944651603699
MDL:MFCD00070458
CID:84156
PubChem ID:329766868
Update Time:2025-08-03

Hafnium t-butoxide Chemical and Physical Properties

Names and Identifiers

    • Hafnium t-butoxide
    • Hafnium tert-butoxide
    • 2-Methyl-propan-2-ol,Hafnium-tetra-tert-butylat
    • 2-methyl-propan-2-ol,hafnium-tetra-tert-butylate
    • Tetratert-butoxyhafnium
    • Hafnium tetra-t-butoxide
    • Hafnium tetra-tert-butoxide
    • Hafnium tetrakis(t-butoxide)
    • Hafnium(4+) tert-butoxide
    • Hafnium(IV) tert-butoxide
    • Tetra-tert-butoxyhafnium
    • Tetrakis(t-butoxy)hafnium
    • hafnium(4+);2-methylpropan-2-olate
    • AKOS025293897
    • FT-0730703
    • DTXSID50433026
    • 2172-02-3
    • WZVIPWQGBBCHJP-UHFFFAOYSA-N
    • DB-009747
    • MDL: MFCD00070458
    • Inchi: 1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4
    • InChI Key: WZVIPWQGBBCHJP-UHFFFAOYSA-N
    • SMILES: [Hf+4].[O-]C(C)(C)C.[O-]C(C)(C)C.[O-]C(C)(C)C.[O-]C(C)(C)C

Computed Properties

  • Exact Mass: 472.20800
  • Monoisotopic Mass: 472.20792g/mol
  • Isotope Atom Count: 0
  • Hydrogen Bond Donor Count: 0
  • Hydrogen Bond Acceptor Count: 4
  • Heavy Atom Count: 21
  • Rotatable Bond Count: 0
  • Complexity: 25.1
  • Covalently-Bonded Unit Count: 5
  • Defined Atom Stereocenter Count: 0
  • Undefined Atom Stereocenter Count : 0
  • Defined Bond Stereocenter Count: 0
  • Undefined Bond Stereocenter Count: 0
  • Topological Polar Surface Area: 92.2?2

Experimental Properties

  • Color/Form: Yellowish liquid
  • Density: 1.166?g/mL?at 25?°C(lit.)
  • Melting Point: 2℃
  • Boiling Point: 90?°C/5?mmHg(lit.)
  • Flash Point: Fahrenheit: 82.4 ° f
    Celsius: 28 ° c
  • Refractive Index: n20/D 1.424(lit.)
  • Solubility: Soluble in hydrocarbons, reacts with alcohols, ketones, and esters
  • PSA: 36.92000
  • LogP: 5.06320
  • Sensitiveness: Moisture Sensitive/Light Sensitive
  • Vapor Pressure: No data available

Hafnium t-butoxide Security Information

  • Symbol: GHS02 GHS07
  • Signal Word:Warning
  • Hazard Statement: H226-H315-H319-H335
  • Warning Statement: P261-P305+P351+P338
  • Hazardous Material transportation number:UN 1993 3/PG 3
  • WGK Germany:3
  • Hazard Category Code: 10-36/37/38
  • Safety Instruction: S16
  • Hazardous Material Identification: Xi
  • HazardClass:3
  • PackingGroup:II
  • TSCA:No
  • Risk Phrases:R10
  • Packing Group:II
  • Safety Term:3
  • Packing Group:II
  • Hazard Level:3
  • Storage Condition:storage at -4℃ (1-2weeks), longer storage period at -20℃ (1-2years)

Hafnium t-butoxide Customs Data

  • HS CODE:2915900090
  • Customs Data:

    China Customs Code:

    2915900090

    Overview:

    2915900090. Other saturated acyclic monocarboxylic acids and their anhydrides(Acyl halide\Peroxygenation)Chemicals\Peroxy acid and its halogenation\nitrification\sulfonation\Nitrosative derivative. VAT:17.0%. Tax refund rate:9.0%. Regulatory conditions:AB(Customs clearance form for Inbound Goods,Customs clearance form for outbound goods). MFN tariff:5.5%. general tariff:30.0%

    Declaration elements:

    Product Name, component content, use to

    Regulatory conditions:

    A.Customs clearance form for Inbound Goods
    B.Customs clearance form for outbound goods

    Inspection and quarantine category:

    R.Sanitary supervision and inspection of imported food
    S.Sanitary supervision and inspection of exported food
    M.Import commodity inspection
    N.Export commodity inspection

    Summary:

    2915900090 other saturated acyclic monocarboxylic acids and their anhydrides, halides, peroxides and peroxyacids; their halogenated, sulphonated, nitrated or nitrosated derivatives VAT:17.0% Tax rebate rate:9.0% Supervision conditions:AB(certificate of inspection for goods inward,certificate of inspection for goods outward) MFN tariff:5.5% General tariff:30.0%

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Hafnium t-butoxide Suppliers

Amadis Chemical Company Limited
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(CAS:2172-02-3)Hafnium t-butoxide
Order Number:A1209369
Stock Status:in Stock
Quantity:2g/10g/50g
Purity:99%
Pricing Information Last Updated:Monday, 2 September 2024 15:58
Price ($):203.0/812.0/2638.0

Hafnium t-butoxide Related Literature

Additional information on Hafnium t-butoxide

Introduction to Hafnium t-butoxide (CAS No. 2172-02-3)

Hafnium t-butoxide, with the chemical formula C12H27Ho4, is a versatile organometallic compound widely utilized in the field of materials science and chemical synthesis. This compound, identified by its CAS number 2172-02-3, is particularly noted for its role as a precursor in the preparation of hafnium-based materials and as an intermediate in various organic transformations. Its unique chemical properties make it a valuable reagent in both industrial and research settings.

The primary significance of hafnium t-butoxide lies in its ability to facilitate the formation of complex hafnium complexes, which are essential in the development of advanced materials such as hafnium dioxide (HfO2) thin films. These thin films are critical components in microelectronics, serving as high-k dielectrics that enhance the performance of semiconductor devices. The compound's stability under various reaction conditions further underscores its utility in these applications.

In recent years, research has highlighted the role of hafnium t-butoxide in catalytic processes. Specifically, it has been employed as a ligand in transition metal-catalyzed reactions, where its ability to stabilize metal centers enhances reaction efficiency and selectivity. For instance, studies have demonstrated its effectiveness in promoting cross-coupling reactions, which are fundamental to constructing complex organic molecules. This application is particularly relevant in pharmaceutical synthesis, where precise molecular construction is paramount.

The compound's structure, featuring a hafnium center coordinated to four t-butoxy groups, contributes to its reactivity and versatility. The bulky t-butoxy groups not only influence the steric environment around the metal center but also play a crucial role in modulating the compound's solubility and thermal stability. These characteristics make it an ideal candidate for applications requiring precise control over reaction conditions.

Recent advancements in nanotechnology have also leveraged hafnium t-butoxide for the synthesis of hafnium-based nanoparticles. These nanoparticles exhibit unique optical and electronic properties that make them suitable for use in sensors, catalysts, and even as components in next-generation solar cells. The ability to precisely control the size and morphology of these nanoparticles is often achieved through controlled hydrolysis and condensation processes initiated by hafnium t-butoxide.

The industrial production of hafnium t-butoxide involves careful purification and handling due to its sensitivity to moisture and air. Typically, it is synthesized through the reaction of hafnium metal or its halides with tert-butanol under controlled conditions. The purity of the final product is critical for ensuring consistent performance in downstream applications.

In academic research, hafnium t-butoxide continues to be a subject of investigation due to its potential applications in green chemistry. Researchers are exploring methods to reduce the environmental impact of its synthesis and use by developing more sustainable protocols. For example, efforts are underway to optimize catalytic systems that minimize waste generation while maintaining high yields of desired products.

The compound's role in polymer chemistry is another area of growing interest. Hafnium t-butoxide has been shown to act as a crosslinking agent in certain polymer systems, enhancing material properties such as thermal stability and mechanical strength. This application is particularly relevant for high-performance polymers used in aerospace and automotive industries where durability under extreme conditions is essential.

Future research directions for hafnium t-butoxide may include exploring its use in photovoltaic devices and energy storage systems. Given its ability to form stable complexes with various metals and ligands, it holds promise as a component in advanced materials designed for efficient energy conversion and storage.

In conclusion, hafnium t-butoxide (CAS No. 2172-02-3) is a multifaceted compound with significant applications across multiple scientific disciplines. Its role as a precursor for advanced materials, a catalyst ligand, and a building block for nanotechnology underscores its importance in modern chemistry and materials science. As research continues to uncover new applications and refine synthetic methodologies, the utility of this compound is expected to expand further.

Recommended suppliers
Amadis Chemical Company Limited
(CAS:2172-02-3)Hafnium t-butoxide
A1209369
Purity:99%/99%/99%
Quantity:2g/10g/50g
Price ($):203.0/812.0/2638.0
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