Cas no 18001-13-3 (Trimethoxy(4-vinylphenyl)silane)
Trimethoxy(4-vinylphenyl)silane Chemical and Physical Properties
Names and Identifiers
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- Benzene,1-ethenyl-4-(trimethoxysilyl)-
- Trimethoxy(4-vinylphenyl)silane
- (4-ethenylphenyl)-trimethoxysilane
- KBM1403
- p-styryltrimethoxysilane
- p-vinyl phenyl trimethoxysilane
- Y 5772
- Silane,(4-ethenylphenyl)trimethoxy-
- (4-ethenylphenyl) trimethoxy-Silane
- p-Styryltrimethylsilane
- 4-(trimethoxysilyl)styrene
- 4-(trimethoxysilyl)-styrene
- (4-Vinylphenyl)trimethoxysilane
- (4-Ethenylphenyl)Trimethoxysilane
- LTQBNYCMVZQRSD-UHFFFAOYSA-N
- (4-Ethenylphenyl)(trimethoxy)silane
- Silane, (4-ethenylphenyl)trimethoxy-
- Benzene, 1-ethenyl-4-(trimethoxysilyl)-
- D92668
- MFCD21596662
- T3185
- AS-64055
- AKOS028113940
- 18001-13-3
- SCHEMBL100085
- Trimethoxy(4-vinylphenyl)silane, >/=97%
- DTXSID10575633
- p-STYRYLTRIMETHOXYSILANE, 96%
- 1-Ethenyl-4-(trimethoxysilyl)benzene
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- MDL: MFCD21596662
- Inchi: 1S/C11H16O3Si/c1-5-10-6-8-11(9-7-10)15(12-2,13-3)14-4/h5-9H,1H2,2-4H3
- InChI Key: LTQBNYCMVZQRSD-UHFFFAOYSA-N
- SMILES: [Si](C1C=CC(C=C)=CC=1)(OC)(OC)OC
Computed Properties
- Exact Mass: 224.08700
- Monoisotopic Mass: 224.08687090g/mol
- Isotope Atom Count: 0
- Hydrogen Bond Donor Count: 0
- Hydrogen Bond Acceptor Count: 3
- Heavy Atom Count: 15
- Rotatable Bond Count: 5
- Complexity: 188
- Covalently-Bonded Unit Count: 1
- Defined Atom Stereocenter Count: 0
- Undefined Atom Stereocenter Count : 0
- Defined Bond Stereocenter Count: 0
- Undefined Bond Stereocenter Count: 0
- Topological Polar Surface Area: 27.7
Experimental Properties
- Color/Form: NA
- Density: 1.0±0.1 g/cm3
- Boiling Point: 77°C/0.2mmHg(lit.)
- Flash Point: 93.4±29.0 °C
- Refractive Index: 1.5050 to 1.5090
- PSA: 27.69000
- LogP: 1.41470
- Vapor Pressure: 0.1±0.4 mmHg at 25°C
Trimethoxy(4-vinylphenyl)silane Security Information
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Symbol:
- Prompt:warning
- Signal Word:warning
- Hazard Statement: H227-H315-H319
- Warning Statement: P210-P264-P280-P302+P352+P332+P313+P362+P364-P305+P351+P338+P337+P313-P370+P378-P403+P235-P501
- Safety Instruction: H227+H315+H319
- Storage Condition:4° CStore…,-4℃Store…Better
Trimethoxy(4-vinylphenyl)silane Customs Data
- HS CODE:2931900090
- Customs Data:
China Customs Code:
2931900090Overview:
2931900090. Other organic-Inorganic compound. VAT:17.0%. Tax refund rate:13.0%. Regulatory conditions:AB(Customs clearance form for Inbound Goods,Customs clearance form for outbound goods). MFN tariff:6.5%. general tariff:30.0%
Summary:
2931900090. other organo-inorganic compounds. VAT:17.0%. Tax rebate rate:13.0%. Supervision conditions:AB(certificate of inspection for goods inward,certificate of inspection for goods outward). MFN tariff:6.5%. General tariff:30.0%
Trimethoxy(4-vinylphenyl)silane Pricemore >>
| Related Categories | No. | Product Name | Cas No. | Purity | Specification | Price | update time | Inquiry |
|---|---|---|---|---|---|---|---|---|
| abcr | AB356959-5 g |
(4-Vinylphenyl)trimethoxysilane, 95%; . |
18001-13-3 | 95% | 5 g |
€77.00 | 2023-07-19 | |
| abcr | AB356959-25 g |
(4-Vinylphenyl)trimethoxysilane, 95%; . |
18001-13-3 | 95% | 25 g |
€249.00 | 2023-07-19 | |
| SHANG HAI JI ZHI SHENG HUA Technology Co., Ltd. | X67305-5g |
Trimethoxy(4-vinylphenyl)silane |
18001-13-3 | ≥97% | 5g |
¥788.0 | 2023-09-05 | |
| SHANG HAI JI ZHI SHENG HUA Technology Co., Ltd. | X67305-1g |
Trimethoxy(4-vinylphenyl)silane |
18001-13-3 | ≥97% | 1g |
¥188.0 | 2023-09-05 | |
| SHANG HAI A LA DING SHENG HUA KE JI GU FEN Co., Ltd. | T162304-1g |
Trimethoxy(4-vinylphenyl)silane |
18001-13-3 | 97% | 1g |
¥223.90 | 2023-08-31 | |
| SHANG HAI A LA DING SHENG HUA KE JI GU FEN Co., Ltd. | T162304-25G |
Trimethoxy(4-vinylphenyl)silane |
18001-13-3 | 97% | 25g |
¥2500.90 | 2023-08-31 | |
| SHANG HAI A LA DING SHENG HUA KE JI GU FEN Co., Ltd. | T162304-5G |
Trimethoxy(4-vinylphenyl)silane |
18001-13-3 | 97% | 5g |
¥929.90 | 2023-08-31 | |
| TI XI AI ( SHANG HAI ) HUA CHENG GONG YE FA ZHAN Co., Ltd. | T3185-5G |
Trimethoxy(4-vinylphenyl)silane |
18001-13-3 | >97.0%(GC) | 5g |
¥925.00 | 2024-04-17 | |
| TI XI AI ( SHANG HAI ) HUA CHENG GONG YE FA ZHAN Co., Ltd. | T3185-25G |
Trimethoxy(4-vinylphenyl)silane |
18001-13-3 | >97.0%(GC) | 25g |
¥2695.00 | 2024-04-17 | |
| SHANG HAI MAI KE LIN SHENG HUA Technology Co., Ltd. | T865384-1g |
Trimethoxy(4-vinylphenyl)silane |
18001-13-3 | ≥97% | 1g |
¥228.00 | 2022-09-28 |
Trimethoxy(4-vinylphenyl)silane Suppliers
Trimethoxy(4-vinylphenyl)silane Related Literature
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Huifang Yang,Haoran Guo,Peidong Fan,Xinpan Li,Wenlu Ren,Rui Song Nanoscale, 2020,12, 7024-7034
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Haitao Li,Yu Pan,Zhizhi Wang,Shan Chen,Ruixin Guo,Jianqiu Chen RSC Adv., 2015,5, 100775-100782
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Priyambada Nayak,Tanmaya Badapanda,Anil Kumar Singh,Simanchalo Panigrahi RSC Adv., 2017,7, 16319-16331
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Xiaofeng Lin RSC Adv., 2016,6, 9002-9006
Additional information on Trimethoxy(4-vinylphenyl)silane
Trimethoxy(4-vinylphenyl)silane: A Comprehensive Overview
Trimethoxy(4-vinylphenyl)silane (CAS No. 18001-13-3) is a versatile organosilicon compound that has garnered significant attention in the fields of materials science, organic synthesis, and electronics. This compound, also referred to as vinyltrimethoxysilane, is characterized by its unique chemical structure, which combines a phenyl group substituted with a vinyl moiety and three methoxy groups attached to a central silicon atom. Its structure makes it highly reactive and suitable for a wide range of applications.
The synthesis of Trimethoxy(4-vinylphenyl)silane typically involves the reaction of chlorotrimethylsilane with 4-vinylphenol in the presence of a base, such as potassium tert-butoxide. This reaction is well-documented in the literature and highlights the importance of controlling reaction conditions to achieve high yields and purity. Recent studies have explored alternative synthetic routes, including the use of microwave-assisted synthesis, which has shown promise in reducing reaction times while maintaining product quality.
One of the most notable applications of Trimethoxy(4-vinylphenyl)silane is in the preparation of organosilicon polymers and copolymers. These materials exhibit excellent thermal stability, mechanical strength, and resistance to environmental factors, making them ideal for use in high-performance coatings, adhesives, and electronic encapsulants. For instance, researchers have demonstrated the use of this compound in the synthesis of UV-curable siloxane networks, which exhibit superior adhesion properties and flexibility.
In addition to its role in polymer chemistry, Trimethoxy(4-vinylphenyl)silane has found applications in organic synthesis as a precursor for various functionalized silanes. Its reactivity with alcohols, amines, and other nucleophiles allows for the preparation of tailored siloxane derivatives with specific functionalities. Recent advancements in click chemistry have further expanded its utility, enabling the formation of robust covalent bonds between siloxane frameworks and other organic molecules.
The electronic properties of materials derived from Trimethoxy(4-vinylphenyl)silane have also been extensively studied. For example, films prepared from this compound exhibit semiconducting behavior, making them potential candidates for use in thin-film transistors (TFTs) and other electronic devices. Researchers have explored the incorporation of this compound into hybrid organic-inorganic materials, which combine the advantages of both organic semiconductors and siloxane matrices.
From an environmental perspective, Trimethoxy(4-vinylphenyl)silane is considered relatively stable under normal storage conditions. However, its reactivity with water necessitates careful handling during synthesis and processing. Recent studies have focused on developing eco-friendly synthetic methods and recycling strategies to minimize waste generation and improve sustainability.
In conclusion, Trimethoxy(4-vinylphenyl)silane (CAS No. 18001-13-3) is a multifaceted organosilicon compound with a wide range of applications across various industries. Its unique chemical structure, reactivity, and compatibility with diverse functional groups make it an invaluable tool for researchers and industry professionals alike. As advancements in materials science continue to unfold, this compound is expected to play an increasingly important role in the development of next-generation materials.
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