Cas no 13871-89-1 ((cyclohexyloxy)(trimethyl)silane)
13871-89-1 structure
Product Name:(cyclohexyloxy)(trimethyl)silane
CAS No:13871-89-1
MF:C9H20OSi
MW:172.340003967285
CID:902372
Update Time:2025-04-19
(cyclohexyloxy)(trimethyl)silane Chemical and Physical Properties
Names and Identifiers
-
- (cyclohexyloxy)(trimethyl)silane
- cyclohexyloxy(trimethyl)silane
- Trimethyl(cyclohexyloxy)silane
- (CH3)3SiOC6H11-c
- cyclohexyl trimethysilyl ether
- cyclohexyl-OSiMe3
- cyclohexyltrimethylsilyl ether
- Silane,(cyclohexyloxy)trimethyl
- Trimethylsiloxycyclohexane
- (Trimethylsiloxy)cyclohexane
- (Cyclohexyloxy)trimethylsilane
- Cyclohexyl(trimethylsilyl) ether
- (Trimethylsilyl)cyclohexyl ether
-
- Inchi： 1S/C9H20OSi/c1-11(2,3)10-9-7-5-4-6-8-9/h9H,4-8H2,1-3H3
- InChI Key： PGRDNHQIURCHPZ-UHFFFAOYSA-N
- SMILES： [Si](C)(C)(C)OC1CCCCC1
Computed Properties
- Exact Mass: 172.12800
Experimental Properties
- PSA: 9.23000
- LogP: 3.17060
(cyclohexyloxy)(trimethyl)silane Customs Data
- HS CODE：2931900090
- Customs Data：
China Customs Code:
2931900090Overview:
2931900090. Other organic-Inorganic compound. VAT:17.0%. Tax refund rate:13.0%. Regulatory conditions:AB(Customs clearance form for Inbound Goods,Customs clearance form for outbound goods). MFN tariff:6.5%. general tariff:30.0%
Summary:
2931900090. other organo-inorganic compounds. VAT:17.0%. Tax rebate rate:13.0%. Supervision conditions:AB(certificate of inspection for goods inward,certificate of inspection for goods outward). MFN tariff:6.5%. General tariff:30.0%
(cyclohexyloxy)(trimethyl)silane Related Literature
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Ana G. Neo,Ana Bornadiego,Jesús Díaz,Stefano Marcaccini,Carlos F. Marcos Org. Biomol. Chem., 2013,11, 6546-6555
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Xing Zhao,Lu Bai,Rui-Ying Bao,Zheng-Ying Liu,Ming-Bo Yang,Wei Yang RSC Adv., 2017,7, 46297-46305
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Chung-Sung Yang,Mong-Shian Shih,Fang-Yi Chang New J. Chem., 2006,30, 729-735
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Christopher B. Rodell,Christopher B. Highley,Minna H. Chen,Neville N. Dusaj,Chao Wang,Lin Han,Jason A. Burdick Soft Matter, 2016,12, 7839-7847
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Yiding Jiao,Liqun Kang,Jasper Berry-Gair,Kit McColl,Jianwei Li,Haobo Dong,Hao Jiang,Ryan Wang,Furio Corà,Dan J. L. Brett,Ivan P. Parkin J. Mater. Chem. A, 2020,8, 22075-22082
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