Cas no 12017-12-8 (cobalt disilicide)
cobalt disilicide Chemical and Physical Properties
Names and Identifiers
-
- cobalt disilicide
- Cobalt silicide
- Cobalt Silicide (Metals Basis)
- Cobalt silicide, 99% (metals basis)
- COBALT SILICIDE ISO 9001:2015 REACH
- Titanium Carbonitride (TiCN) Sputtering Targets
-
- MDL: MFCD00016021
- Inchi: 1S/Co.Si2/c;1-2/q+2;-2
- InChI Key: MGBPEPAGHAEWKQ-UHFFFAOYSA-N
- SMILES: [Si-]#[Si-].[Co+2]
Computed Properties
- Exact Mass: 114.88700
- Isotope Atom Count: 0
- Hydrogen Bond Donor Count: 0
- Hydrogen Bond Acceptor Count: 2
- Heavy Atom Count: 3
- Rotatable Bond Count: 0
- Complexity: 8
- Covalently-Bonded Unit Count: 2
- Defined Atom Stereocenter Count: 0
- Undefined Atom Stereocenter Count : 0
- Defined Bond Stereocenter Count: 0
- Undefined Bond Stereocenter Count: 0
- Surface Charge: 0
- XLogP3: Not available
- Topological Polar Surface Area: 0
Experimental Properties
- Color/Form: Gray powder, cubic crystal
- Density: 5.30
- Melting Point: 1277°C
- Boiling Point: No data available
- Flash Point: No data available
- Solubility: 溶于熱HCl
- Water Partition Coefficient: Insoluble in water.
- PSA: 0.00000
- LogP: -0.76160
- Solubility: Insoluble in water
- Vapor Pressure: No data available
cobalt disilicide Security Information
- Signal Word:warning
- Hazard Statement: H303May be harmful if swallowed+H313Skin contact may be harmful+H333Inhalation may be harmful to the body
-
Warning Statement:
P264Thoroughly clean after treatment
P280Wear protective gloves/Wear protective clothing/Wear protective goggles/Wear a protective mask
P305If it enters the eyes
P351Rinse carefully with water for a few minutes
P338Remove the contact lens(If any)And easy to operate,Continue flushing
P337If eye irritation persists
P313Obtain medical advice/care - Safety Instruction: H303May be harmful if swallowed+H313Skin contact may be harmful+H333Inhalation may be harmful to the body
- TSCA:Yes
- Storage Condition:Ambient temperatures.
cobalt disilicide Pricemore >>
| Related Categories | No. | Product Name | Cas No. | Purity | Specification | Price | update time | Inquiry |
|---|---|---|---|---|---|---|---|---|
| abcr | AB203249-25 g |
Cobalt silicide, 99% (metals basis); . |
12017-12-8 | 99% | 25 g |
€78.60 | 2023-07-20 | |
| abcr | AB203249-100 g |
Cobalt silicide, 99% (metals basis); . |
12017-12-8 | 99% | 100 g |
€191.00 | 2023-07-20 | |
| SHANG HAI XIAN DING Biotechnology Co., Ltd. | F-AJ750-5g |
Cobalt silicide |
12017-12-8 | 99% (metals basis) | 5g |
¥330.0 | 2022-02-28 | |
| SHANG HAI XIAN DING Biotechnology Co., Ltd. | F-AJ750-1g |
Cobalt silicide |
12017-12-8 | 99% (metals basis) | 1g |
¥115.0 | 2022-02-28 | |
| A FA AI SHA , SAI MO FEI SHI ER KE JI QI XIA GONG SI | 13115-25g |
Cobalt silicide, 99% (metals basis) |
12017-12-8 | 99% | 25g |
¥994.00 | 2023-02-09 | |
| A FA AI SHA , SAI MO FEI SHI ER KE JI QI XIA GONG SI | 13115-100g |
Cobalt silicide, 99% (metals basis) |
12017-12-8 | 99% | 100g |
¥3543.00 | 2023-02-09 | |
| SHENG KE LU SI SHENG WU JI SHU | sc-268750-25 g |
Cobalt silicide, |
12017-12-8 | 99% (metals basis) | 25g |
¥948.00 | 2023-07-11 | |
| SHENG KE LU SI SHENG WU JI SHU | sc-268750-25g |
Cobalt silicide, |
12017-12-8 | 99% (metals basis) | 25g |
¥948.00 | 2023-09-05 | |
| abcr | AB203249-25g |
Cobalt silicide, 99% (metals basis); . |
12017-12-8 | 99% | 25g |
€85.00 | 2025-02-18 | |
| abcr | AB203249-100g |
Cobalt silicide, 99% (metals basis); . |
12017-12-8 | 99% | 100g |
€200.00 | 2025-02-18 |
cobalt disilicide Related Literature
-
Nan Fu,Naphaporn Chiewchan,Xiao Dong Chen Food Funct., 2020,11, 211-220
-
Thi Thu Tram Nguyen,Thanh Binh Nguyen Org. Biomol. Chem., 2021,19, 6015-6020
-
Jason Y. C. Lim,Yong Yu,Guorui Jin,Kai Li,Yi Lu,Jianping Xie Nanoscale Adv., 2020,2, 3921-3932
Additional information on cobalt disilicide
Cobalt Disilicide (CAS No. 12017-12-8): A Comprehensive Overview of Its Properties and Applications
Cobalt disilicide, with the chemical formula CoSi2, is a compound that has garnered significant attention in the field of materials science and electronics due to its unique structural and electronic properties. The compound is identified by its CAS number 12017-12-8, which distinguishes it from other silicon-based compounds. This introduction aims to provide a detailed exploration of CoSi2, covering its synthesis, physical and chemical properties, as well as its emerging applications in modern technology.
The synthesis of CoSi2 typically involves the reaction between cobalt metal and silicon at high temperatures, often in an inert atmosphere to prevent oxidation. The process can be represented by the following chemical equation:
Co + 2Si → CoSi2
This reaction requires precise control of temperature and pressure to ensure the formation of high-purity Cobalt disilicide. The resulting compound is a black crystalline solid with a hexagonal crystal structure, which contributes to its remarkable thermal and electrical conductivity properties.
Cobalt disilicide exhibits several notable physical properties that make it attractive for various technological applications. Its high melting point, approximately 1475°C, allows it to maintain structural integrity under extreme conditions. Additionally, CoSi2 has a high electrical conductivity, making it a promising material for use in semiconductor devices and electronic components.
The electronic properties of Cobalt disilicide are particularly intriguing. It is a narrow-bandgap semiconductor, which means it can efficiently convert light into electricity and vice versa. This property has led to research into its potential use in photovoltaic cells and optoelectronic devices. Recent studies have shown that Cobalt disilicide can be used to enhance the efficiency of solar cells by improving charge carrier mobility and reducing recombination losses.
In addition to its electronic properties, Cobalt disilicide also demonstrates excellent thermal stability, making it suitable for high-temperature applications such as heat sinks and thermal barriers. Its ability to withstand prolonged exposure to high temperatures without degradation has made it a candidate material for use in aerospace and automotive industries.
The emerging applications of Cobalt disilicide extend beyond electronics and thermal management. Researchers are exploring its potential use in catalysis due to its ability to facilitate various chemical reactions without itself being consumed. This property makes it an attractive candidate for use in industrial processes where efficiency and selectivity are critical.
Cobalt disilicide has also shown promise in the field of energy storage. Its unique electronic structure allows it to store energy efficiently, making it a potential candidate for use in batteries and supercapacitors. Studies have indicated that incorporating CoSi2 into battery electrodes can significantly improve charge density and cycle life.
The research on Cobalt disilicide is ongoing, with scientists continuously uncovering new potential applications. One area of active research is the use of Cobalt disilicide in spintronics, where its magnetic properties are being explored for use in data storage devices. The ability of Cobalt disilicide to exhibit both spintronic and electronic properties makes it a versatile material for next-generation computing technologies.
The environmental impact of using Cobalt disilicide is also a subject of interest. As a compound derived from non-toxic elements, it presents an environmentally friendly alternative to traditional materials used in electronics and catalysis. This aligns with the growing trend towards sustainable materials development, where environmental considerations are prioritized alongside performance metrics.
In conclusion, Cobalt disilicide (CAS No. 12017-12-8) is a multifaceted material with a wide range of potential applications across various industries. Its unique combination of physical and electronic properties makes it an attractive candidate for use in semiconductors, thermal management systems, catalysis, energy storage, and spintronics. As research continues to uncover new possibilities for this compound, its role in advancing modern technology is likely to expand further.
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