Cas no 117762-99-9 (5-(Chloromethyl)-3-(2,6-dichlorophenyl)-1,2,4-oxadiazole)
117762-99-9 structure
Product Name:5-(Chloromethyl)-3-(2,6-dichlorophenyl)-1,2,4-oxadiazole
CAS No:117762-99-9
MF:C9H5Cl3N2O
MW:263.507798910141
CID:131610
PubChem ID:2798826
Update Time:2025-04-19
5-(Chloromethyl)-3-(2,6-dichlorophenyl)-1,2,4-oxadiazole Chemical and Physical Properties
Names and Identifiers
-
- 5-(Chloromethyl)-3-(2,6-dichlorophenyl)-1,2,4-oxadiazole
- 1,2,4-Oxadiazole,5-(chloromethyl)-3-(2,6-dichlorophenyl)-
- 1,2,4-Oxadiazole,5-(chloromethyl)-3-(2,6-dichlorophenyl)
- SCHEMBL2245541
- 117762-99-9
- DTXSID60384035
- FT-0730435
- DB-026293
-
- Inchi： 1S/C9H5Cl3N2O/c10-4-7-13-9(14-15-7)8-5(11)2-1-3-6(8)12/h1-3H,4H2
- InChI Key： HLKHQFLBFDOPKJ-UHFFFAOYSA-N
- SMILES： ClC1C=CC=C(C=1C1=NOC(CCl)=N1)Cl
Computed Properties
- Exact Mass: 261.94700
- Monoisotopic Mass: 261.946746g/mol
- Isotope Atom Count: 0
- Hydrogen Bond Donor Count: 0
- Hydrogen Bond Acceptor Count: 3
- Heavy Atom Count: 15
- Rotatable Bond Count: 2
- Complexity: 210
- Covalently-Bonded Unit Count: 1
- Defined Atom Stereocenter Count: 0
- Undefined Atom Stereocenter Count : 0
- Defined Bond Stereocenter Count: 0
- Undefined Bond Stereocenter Count: 0
- XLogP3: 3.5
- Topological Polar Surface Area: 38.9?2
Experimental Properties
- Density: 1.5
- Boiling Point: 384.7°Cat760mmHg
- Flash Point: 186.5°C
- Refractive Index: 1.585
- PSA: 38.92000
- LogP: 3.78220
5-(Chloromethyl)-3-(2,6-dichlorophenyl)-1,2,4-oxadiazole Customs Data
- HS CODE：2934999090
- Customs Data：
China Customs Code:
2934999090Overview:
2934999090. Other heterocyclic compounds. VAT:17.0%. Tax refund rate:13.0%. Regulatory conditions:nothing. MFN tariff:6.5%. general tariff:20.0%
Declaration elements:
Product Name, component content, use to
Summary:
2934999090. other heterocyclic compounds. VAT:17.0%. Tax rebate rate:13.0%. . MFN tariff:6.5%. General tariff:20.0%
5-(Chloromethyl)-3-(2,6-dichlorophenyl)-1,2,4-oxadiazole Related Literature
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Sowmyalakshmi Venkataraman RSC Adv., 2015,5, 73807-73813
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Albertus D. Handoko,Khoong Hong Khoo,Teck Leong Tan,Hongmei Jin,Zhi Wei Seh J. Mater. Chem. A, 2018,6, 21885-21890
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Kay S. McMillan,Anthony G. McCluskey,Annette Sorensen,Marie Boyd,Michele Zagnoni Analyst, 2016,141, 100-110
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Hanie Hashtroudi,Ian D. R. Mackinnon J. Mater. Chem. C, 2020,8, 13108-13126
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