Cas no 103588-79-0 ((2,3-Dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate)
103588-79-0 structure
Product Name:(2,3-Dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate
CAS No:103588-79-0
MF:C9H19F3O3SSi
MW:292.391073465347
MDL:MFCD00012174
CID:125739
PubChem ID:4080852
Update Time:2025-04-18
(2,3-Dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate Chemical and Physical Properties
Names and Identifiers
-
- (2,3-Dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate
- (2,3-Dimethylbutan-2-yl)dimethylsilyl-trifluoromethanesulfonate
- [2,3-dimethylbutan-2-yl(dimethyl)silyl] trifluoromethanesulfonate
- Methanesulfonic acid,1,1,1-trifluoro-, dimethyl(1,1,2-trimethylpropyl)silyl ester
- THEXYLDIMETHYLSILYLTRIFLUOROMETHANESULFONATE
- (1,1,2,2-tetramethyleth-1-yl)-dimethylsilyl trifluoromethanesulfonate
- (dimethyl)hexylsilyl trifluoromethanesulfonate
- Dimethyl-(2,3-dimethyl-2-butyl)silyl trifluoromethanesulfonate
- thexyldimethylsilyl triflate
- Thexyl-dimethylsilyl trifluoromethanesulfonate
- Trifluoromethanesulfonic acid thexyl-di
- TDS TRIFLATE
- THEXYL-DIMETHYLSILYL TRIFLUOROMETHANSULFONATE
- DIMETHYLTHEXYLSILYL TRIFLUOROMETHANESULFONATE
- TRIFLUOROMETHANESULFONIC AND THEXYL-DIMETHYLSILYL ESTER
- Dimethyl-(2,3-dimethyl-2-butyl)silyl trifluoromethanesulfonate, TDS triflate, Thexyl-dimethylsilyl trifluoromethanesulfonate, Trifluoromethanesulfonic acid thexyl-dimethylsilyl ester
- AKOS016007448
- FT-0745955
- (2,3-Dimethylbutan-2-yl)dimethylsilyltrifluoromethanesulfonate
- DIMETHYL-(2,3-DIMETHYL-2-BUTYL)SILYLTRIFLUOROMETHANESULFONATE
- J-001005
- SCHEMBL3468768
- 103588-79-0
- MFCD00012174
- DTXSID50399113
- ThexyldimethylsilylTriflate
- thexyl-dimethylsilyl trifluoromethanesul fonate
-
- MDL： MFCD00012174
- Inchi： 1S/C9H19F3O3SSi/c1-7(2)8(3,4)17(5,6)15-16(13,14)9(10,11)12/h7H,1-6H3
- InChI Key： HUCZOYCXPWONIR-UHFFFAOYSA-N
- SMILES： S(C(F)(F)F)(=O)(=O)O[Si](C)(C)C(C)(C)C(C)C
Computed Properties
- Exact Mass: 292.07800
- Monoisotopic Mass: 292.07762666g/mol
- Isotope Atom Count: 0
- Hydrogen Bond Donor Count: 0
- Hydrogen Bond Acceptor Count: 3
- Heavy Atom Count: 17
- Rotatable Bond Count: 5
- Complexity: 366
- Covalently-Bonded Unit Count: 1
- Defined Atom Stereocenter Count: 0
- Undefined Atom Stereocenter Count : 0
- Defined Bond Stereocenter Count: 0
- Undefined Bond Stereocenter Count: 0
- Topological Polar Surface Area: 51.8?2
Experimental Properties
- Density: 1.16?g/mL?at 20?°C(lit.)
- Boiling Point: 53-54?°C0.6?mm Hg(lit.)
- Flash Point: 85?°C
- Refractive Index: n20/D 1.405
- PSA: 51.75000
- LogP: 4.57470
(2,3-Dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate Security Information
- Hazardous Material transportation number：UN 3265 8/PG 2
- WGK Germany：3
- Hazard Category Code： 14-34
- Safety Instruction： S26; S27; S36/37/39; S45
- FLUKA BRAND F CODES：10-21
-
Hazardous Material Identification：
- HazardClass：8
- PackingGroup：III
- Packing Group：III
- Packing Group：III
- Risk Phrases：R14; R34
(2,3-Dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate Pricemore >>
| Related Categories | No. | Product Name | Cas No. | Purity | Specification | Price | update time | Inquiry |
|---|---|---|---|---|---|---|---|---|
| eNovation Chemicals LLC | Y1132614-5g |
(2,3-dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate |
103588-79-0 | 95% | 5g |
$1800 | 2024-07-23 | |
| eNovation Chemicals LLC | Y1132614-5g |
(2,3-dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate |
103588-79-0 | 95% | 5g |
$1800 | 2025-02-20 | |
| eNovation Chemicals LLC | Y1132614-5g |
(2,3-dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate |
103588-79-0 | 95% | 5g |
$1800 | 2025-02-27 |
(2,3-Dimethylbutan-2-yl)dimethylsilyl trifluoromethanesulfonate Related Literature
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Olga Guselnikova,Gérard Audran,Jean-Patrick Joly,Andrii Trelin,Evgeny V. Tretyakov,Vaclav Svorcik,Oleksiy Lyutakov,Sylvain R. A. Marque Chem. Sci., 2021,12, 4154-4161
-
Bin Han,Yasuo Shimizu,Gabriele Seguini,Celia Castro,Gérard Ben Assayag,Koji Inoue,Yasuyoshi Nagai,Sylvie Schamm-Chardon,Michele Perego RSC Adv., 2016,6, 3617-3622
-
Jacob S. Jordan,Evan R. Williams Analyst, 2021,146, 2617-2625
-
Chen Long,Ying Dai,Jianwei Li,Hao Jin Nanoscale, 2020,12, 21124-21130
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